The first domestic lithography facility for the production of microchips using modern technology is being developed at the Institute of Applied Physics of the Russian Academy of Sciences. It is reported that a demonstration sample is already ready, on which it was possible to obtain individual images on substrates with a resolution of up to 7 nm. Nevertheless, experts say that the process of creating a full-fledged industrial equipment will take 6 years.
Today in Russia, only chips over 65 nm (mainly 90 nm or more) are mass-produced. Such components are used in the automotive, aerospace and industrial sectors. However, there are still processors for small electronics, which require 7-28 nm manufacturing processes. These are computers, laptops, smartphones and so on.
The process of creating domestic lithographic equipment was divided into three stages. The task at the first stage (until 2024) is to develop a working plant with a full cycle of operations and make it attractive to investors. At the second stage (2024-2026), it is planned to improve the system: increase the resolution, increase productivity and robotize some operations. The installation can already be used in large-scale production. At the third stage (2026-2028), a more powerful radiation source, improved positioning and feed systems will appear, the installation will work quickly and accurately. And only after that in Russia, perhaps, they will be able to produce 7 nm products.
In Russia, the task is not to compete with technological leaders in lithography, but to meet their needs from the very beginning. In addition, Russian specialists want to develop original technology. They have already created a technology demonstrator on another source of radiation – X-ray, which is much more compact and cleaner in operation. The institute has already stated that their installation will be 1.5-2 times more efficient than ASML equipment.
Source: Trash Box
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